Utra-Low-Power Logic Style for Low-Frequency High-Temperature Applications
Utra-Low-Power Logic Style for Low-Frequency High-Temperature Applications
Tác giả: David Bol, Denis Flandre, Jean-Didier Legat
Nơi xuất bản: Microelectronics Laboratory, Université catholique de Louvain, Place du Levant 3, 1348 Louvain-la-Neuve, Belgium
Nội dung chính:
For ultra-low-power applications as sensor networks, digital integrated circuits may operate at low frequency
to reduce dynamic power consumption [1]. At high temperature, the power consumption of such circuits can
be dominated by static power dissipation due to leakage current. To avoid prohibitive static power dissipation, designers of high-temperature circuits use very-high-VT devices on micron-scale SOI technologies [2]. In this contribution, we propose a new logic style, namely Ultra-Low-Power (ULP) logic style, to benefit from the small area and low dynamic power of SOI deep-submicron technologies while keeping ultra-low leakage. In 0.13-µm PD-SOI technology, the static power consumption in active mode is reduced by nearly 3 orders of magnitude at the expense of increased delay.
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Ultra-Low-Power Logic Style for Low-Frequency
High-Temperature Applications
David Bol, Denis Flandre, Jean-Didier Legat
Microelectronics Laboratory, Université catholique de Louvain
Place du Levant 3, 1348 Louvain-la-Neuve, Belgium
{david.bol,denis.flandre,jean-didier.legat}@uclouvain.be
1. Abstract
For ultra-low-power applications as sensor networks,
digital integrated circuits may operate at low frequency
to reduce dynamic power consumption [1]. At high
temperature, the power consumption of such circuits can
be dominated by static power dissipation due to leakage
current. To avoid prohibitive static power dissipation,
designers of high-temperature circuits use very-high-VT
devices on micron-scale SOI technologies [2]. In this
contribution, we propose a new logic style, namely
Ultra-Low-Power (ULP) logic style, to benefit from the
small area and low dynamic power of SOI deep-
submicron technologies while keeping ultra-low
leakage. In 0.13-µm PD-SOI technology, the static
power consumption in active mode is reduced by nearly
3 orders of magnitude at the expense of increased delay.
2. ULP logic style
The structure of ULP logic gates is presented in Fig. 1
[3]. It is based on the equivalent standard CMOS gate
with addition of 2 extra devices to gate subthreshold
leakage, whose gates are connected to the output node.
The header is an NMOS device and the footer is a
PMOS device. The connection of the output node to the
gate of the header and footer devices acts as a feedback
loop by cutting off more the leakage current of the
header or the footer device, depending on the output
logic level. As shown in Fig. 1 for the ULP inverter,
SOI implementation leads to compact layout as the
footer (resp. header) can be abutted to the pull-down
NMOS (resp. pull-up PMOS).
Fig.1: ULP logic gate schematic and ULP inverter layout
3. Leakage reduction mechanism
Let us consider IOFF current of the pull-down network
(with PMOS footer device included) from the ULP
inverter when input voltage is low, as presented in Fig.
2. The leakage reduction mechanism is based on the
self-biased negative VGS of the NMOS and PMOS
devices inside the pull-down network. VGS values
depend on VA voltage of the internal node A. If devices
are symmetrical, VA is close to VDD/2. Devices thus
operate with VGS close to -VDD/2, leading to ultra-low
leakage. Fig. 2 shows measured IOFF,ULP from ULP pull-
down network in standard 0.13-µm PD-SOI technology
at room and at high temperatures. When VDD increases,
the subthreshold current first increases because VDS of
the NMOS and PMOS devices increase too. Then, it
strongly decreases as VGS of the devices becomes more
and more negative. At room temperature, GIDL and
gate leakage currents limit the achievable leakage when
VDD is higher than 0.7V [4]. At room temperature,
IOFF,ULP is reduced by more than 4 orders of magnitudes
as compared to IOFF,NMOS of standard NMOS device
(VDD=1V). At high temperature, this reduction of IOFF
remains larger than 3 orders of magnitude.
Fig.2: Measured IOFF vs. VDD (L=0.13 µm)
4. DC behaviour
In order to assess the correct operation and the
robustness of the ULP logic style, let us examine the
DC characteristic of the ULP inverter depicted in Fig. 3.
Simulation of the voltage transfer curve at 200°C is also
presented in Fig. 3. The output levels are close to 0 and
VDD. When VIN=0V, VGS of P1 is highly negative and
P1 represents a small equivalent impedance. N2 has
thus VGS=0 and the ION pull-up current is the
subthreshold current of N2. This ION current is nearly 3
orders of magnitude higher than IOFF of pull-down
network, as shown in Fig. 1. Similar reasoning can be
applied to the case VIN=VDD. This leads to very good
output logic levels. Moreover, as ION is only
subthreshold current, the slope of the voltage transfer
curve from the inverter is very steep, making the design
very robust. The drawback is that the delay of the
inverter will be high because ION is a subthreshold
current. This is mitigated by the use of low-VT devices
and the high temperature operation.
The curve from Fig. 3 shows hysteresis, the inverter
switching voltage is different when the input is rising or
falling. This is due to the feedback loop made of the
connection of the output node to the header/footer gates
[3]. This provides a very high static Noise Margin (NM)
for the inverter: NML=0.79V and NMH=0.82V for
VDD=1V, which are never achieved with standard
CMOS logic style. This unique feature is highly
valuable to build robust ultra-low-power SRAM cells.
Fig.3: Simulated voltage transfer curve of ULP inverter
(W/LN1,P1,P2=0.15/0.13[µm] and W/LN2=0.3/0.13 [µm],
VDD=1V, T=200°C)
5. Performance comparison
In order to assess the efficiency of ULP logic style,
performances are compared with standard CMOS logic
style at gate level through simulation of an inverter with
fan-out of 4. For ultra-low-power applications, delay of
the gates is not of uttermost interest. The circuit only
has to support low operating frequency in the kHz
range. Therefore, we consider the following figures of
merit: static current and total power consumption at low
operating frequencies (i.e. 1 and 100 kHz), rather than
power-delay or energy-delay products. The delay is
given for information purpose.
The considered technology is a dual-VT technology.
Low-VT devices (VT,N=0.34V, VT,P=-0.33V) are used
for ULP logic style to increase drivability of pull-
up/down networks and high-VT devices (VT,N=0.43,
VT,P=-0.42V) are used for standard CMOS logic style to
lower static current. Simulation results are summarized
in Table 1.
At 1V, ULP inverter provides a static current reduction
of nearly 3 orders of magnitude as compared to standard
high-VT CMOS inverter. It leads to very low total power
consumption in the pW-range at the expense of longer
delay. Notice that the 34-ns delay for FO4 inverter is
sufficient to operate circuits at low frequencies such as
100 kHz. The power consumption of high-VT CMOS
inverter at 100 kHz is in the nW-range, being dominated
by static current. As shown in Table I, lowering the
power supply voltage of high-VT CMOS logic leads to
lower power but it remains in the nW-range.
TABLE I. PERFORMANCE COMPARISON OF INVERTERS AT 200°C
6. Conclusions
We proposed an ULP logic style to benefit from small
area and small dynamic power of deep-submicron
technologies while keeping ultra-low-leakage at high
temperature. ULP logic style is shown to be very robust
and to reduce power consumption at low frequency by
nearly 3 orders of magnitude. In order for the standard
CMOS inverter to achieve the same static current as the
ULP inverter, SPICE simulations show that VT of the
devices from the CMOS inverter should be raised by
0.35V. This would lead to a threshold voltage of nearly
0.8V. Such a value is no longer proposed by chip
manufacturers in very deep-submicron technologies.
ULP logic style is thus a unique technique to design
ultra-low-power digital circuits for high-temperature
applications, i.e. with neither extra mask nor extra
process cost.
Acknowledgment
D. Bol and D. Flandre are with UCL respectively as research
fellow and honorary senior research associate of the FNRS of
Belgium. The authors would like to thank STMicroelectronics
for the device manufacturing.
References
[1] M. Hempstead et al.: “An Ultra Low Power System
Architecture for Sensor Network Applications”, in Proc. of the
32nd International Symposium on Computer Architecture
(ISCA’05), Madison, Jun. 2005.
[2] Ph. Manet et al.: “Low Power Techniques Applied to an
80C51 Microcontroller for High Temperature Applications”,
in Journal of Low-Power Electronics, vol. 2, pp. 95-104, 2006.
[3] D. Bol et al.: “Building Ultra-Low-Power Low-Frequency
Digital Circuits with High-Speed Devices”, in Proc. of the 14th
IEEE International Conference on Circuits, Electronics and
Systems, (ICECS’07), Marrakech, Dec. 2007.
[4] D. Levacq et al.: “Low Leakage SOI CMOS static
Memory Cell with Ultra-Low Power Diode”, IEEE Journal of
Solid-State Circuits”, vol. 42(3), pp. 689-702, Mar. 2007.
Type VDD [V] ISTAT
Delay
[ns]
Power
@ 1 kHz
Power
@ 100 kHz
ULP 1 31 pA 34 32 pW 154 pW
High VT 1 27 nA 0.01 27 nW 30 nW
High VT 0.5 13 nA 0.37 6.8 nW 7.7 nW
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